Molybdenum Sputtering Target

Molybdenum sputtering targets are essential materials used in Physical Vapor Deposition (PVD) processes. They are made from pure molybdenum or molybdenum alloys and are used to deposit functional thin films onto substrates. Molybdenum sputtering targets find widespread applications in various industries due to their excellent properties. Here’s a summary of their features and classification:

Molybdenum Sputtering Targets Characteristics

  • High Melting Point: Molybdenum has a high melting point of approximately 2620 degrees Celsius, providing excellent stability at high temperatures.
  • Good Electrical Conductivity: Molybdenum is an excellent electrical conductor, making it widely used in the electronics and semiconductor industries.
  • Corrosion Resistance: Molybdenum exhibits good resistance to many chemical substances, making it suitable for processes in corrosive environments.
  • Mechanical Properties: Molybdenum has high yield strength and tensile strength, providing outstanding mechanical performance in high-temperature and high-pressure environments.

Molybdenum sputtering targets can be classified based on their composition, shape, and applications:

  • Pure Molybdenum Targets: Made from pure molybdenum, these targets are suitable for applications requiring high material purity, such as in electronic devices and semiconductor manufacturing.
  • Molybdenum Alloy Targets: These targets are composed of molybdenum combined with other elements to form alloys, such as Mo-W (molybdenum-tungsten alloy) or Mo-Ti (molybdenum-titanium alloy). Alloying can modify the properties of molybdenum sputtering targets, such as enhancing corrosion resistance or increasing strength.
  • Planar Targets: Flat-shaped molybdenum sputtering targets are suitable for large-area thin film coating processes, such as coating glass and metal substrates.
  • Rotatable Targets: Cylindrical-shaped molybdenum sputtering targets are used for specialized-shaped substrates, such as pipes and fittings.
molybdenum SPUTTERING TARGETS
MOLYBDENUM SPUTTERING TARGETS
Molybdenum sputtering targetS

Molybdenum Sputtering Targets Applications:

  • Electronics and Semiconductor Industry: Used in the fabrication of thin-film transistors, photovoltaic cells, displays, and integrated circuits.
  • Hard Coatings: Molybdenum sputtering targets are employed to create wear-resistant coatings, enhancing the durability of metal components.
  • Optical Coatings: Utilized to produce thin films with specific optical properties, such as anti-reflection coatings and reflective mirrors.
  • Corrosion Protection: Applied to generate corrosion-resistant coatings, safeguarding metal surfaces from corrosion and oxidation.

In conclusion, molybdenum sputtering targets are crucial materials for producing high-performance thin films, finding diverse applications in various industries. Their outstanding properties and tunability make them an ideal choice for PVD processes.

molybdenum TUNGSTEN Tantalum and Niobium
  • HeNan Ming Chuan Machinery Equipment CO.,LTD
    Add:Beihang Science and Technology ParkLuoyang city, Henan province China
    Tel:+86 13598164311 (Wechat&Whatsapp)
    Email: info@mcwmo.com
    Website: www.mcwmo.com

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