Tungsten Target

,

Tungsten Target

Tungsten target come in various sizes and configurations to meet specific application requirements,  Purity ≥99.95% Meet

Tungsten 3,422°C (6,192°F) ≥99.95% 19.25 g/cm³ ASTM-B-760 , ASTM F288-18

Phone  +8613598164311           accept-email   info@mcwmo.com

Tungsten target are used in various applications, including in the field of thin film deposition and sputtering. There are different types of tungsten targets available, each with its own characteristics and manufacturing processes. Here is a re-creation of the information you provided:

Tungsten plane targets, such as tungsten round targets and tungsten strip-type targets, are produced by processing high-quality tungsten plates. These targets are known for their high density, absence of cracks and sand holes, bright surfaces, uniform color and luster, and precise dimensions.

Small tungsten rotary pressing targets are manufactured from high-quality tungsten bars. They exhibit accurate dimensions, smooth surfaces, and high purity.

Tungsten rotating targets, typically produced through a hot isostatic pressing process, are used in conventional sizes. These targets have a high density of approximately 19.25 g/cm³, fine grains, and excellent molding properties.

The conventional density of tungsten targets ranges from 19 g/cm³ to 19.2 g/cm³. However, special process density can exceed 19.25 g/cm³.

Tungsten targets are widely utilized in physical vapor deposition (PVD) techniques, such as magnetron sputtering, to deposit thin films with high precision. They are employed in industries like electronics, optics, solar cells, and decorative coatings. The specific properties of tungsten targets make them ideal for applications that require high-density, high-purity, and well-formed coatings

Tungsten Target Parameters:

Element: W Purity: ≥99.95% (3N5) Typical sample dimension: 12mm×80mm×100mm Density: 19.25 g/cm3 (HIP) Hardness: HV5:280-310 Grain Size: 43μm Appearance: Ra≤0.4μm

Impurity Content (powder):

  • Ti: ≤10ppm
  • Ni: ≤6ppm
  • Na: ≤5ppm
  • Pb: ≤1ppm
  • C: ≤20ppm
  • P: ≤8ppm
  • Ca: ≤10ppm
  • Cu: ≤5ppm
  • Mg: ≤7ppm
  • Si: ≤10ppm
  • Al: ≤5ppm
  • As: ≤10ppm
  • Fe: ≤10ppm

Tungsten target come in various sizes and configurations to meet specific application requirements,  Purity ≥99.95% Meet

Tungsten 3,422°C (6,192°F) ≥99.95% 19.25 g/cm³ ASTM-B-760 , ASTM F288-18

Tungsten target Phone  +8613598164311        Tungsten target accept-email       info@mcwmo.com

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